Modeling of a Polishing Tool to Simulate Material Removal
نویسندگان
چکیده
منابع مشابه
Material Removal Mechanism in Chemical Mechanical Polishing: Theory and Modeling
The abrasion mechanism in solid-solid contact mode of the chemical mechanical polishing (CMP) process is investigated in detail. Based on assumptions of plastic contact over wafer-abrasive and pad-abrasive interfaces, the normal distribution of abrasive size and an assumed periodic roughness of pad surface, a novel model is developed for material removal in CMP. The basic model is = removed, wh...
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Computer controlled polishing requires accurate knowledge of the tool influence function (TIF) for the polishing tool (i.e. lap). While a linear Preston's model for material removal allows the TIF to be determined for most cases, nonlinear removal behavior as the tool runs over the edge of the part introduces a difficulty in modeling the edge TIF. We provide a new parametric model that fits 5 p...
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ژورنال
عنوان ژورنال: Advanced Materials Research
سال: 2011
ISSN: 1662-8985
DOI: 10.4028/www.scientific.net/amr.223.754